Since completing a multi-purpose manufacturing facility for high-purity fluorine gas in 1988, we have consolidated our position as a major supplier of nitrogen trifluoride, chlorine trifluoride and other cleaning gases for semiconductors and liquid crystal manufacturing equipment.
| Product Name | Purity | Packaging | Applications |
|---|---|---|---|
| NF3 | 99.995% or more | Cylinder (10L, 47L, 440L), Bundle, ISO container Material: Manganese steel | Plasma CVD chamber cleaning gas |
| ClF3 | 99.9% or more | Cylinder (3.4L, 10L, 40L, 88L) Material: Stainless steel |
LP-CVD chamber cleaning gas |
| 20% diluted fluorine (20%F2/N2) |
F2 : 99.9% or more N2 : 99.999% or more |
Cylinder (10L, 47L), Bundle Material: Manganese steel | LP-CVD chamber cleaning gas |
| Anhydrous hydrofluoric acid (HF) |
99.999% or more | Cylinder (3.4L, 10L, 40L) Material: Stainless steel | Etching gas, LP-CVD chamber and exhaust pipe cleaning gas |
For Enquires
Fine Chemicals Sales Department-2
TEL: +81-3-3259-7267
- CVD Process Gases for Semiconductors
- Cleaning Gases for Semiconductors and Liquid Crystal Manufacturing Equipment
- Organic Metallic Compounds
- Other Fluorine Products
- Monomers Aromatics
- Monomers Aliphatics
- Photoresist Materials
- Packaging Materials
