Features of Fluorinated Monomers and Polymers for Photoresist Materials
- High contact angle with water
- Excellent transparency
- High TMAH solubility
- Low refractive index
- High solvent solubility
Product Introduction
We supply methacryl, acryl, α-(trifluoromethyl)-acryl, norbornene, vinyl, styrene monomers with fluoroalcohol, cyclic and strong acid moiety.
ArF Photoresist Pattern
75nm L/S
75nm C/H
80nm L/S
65nm L/S
For Enquiries
Electronic Materials Group, Chemicals Business Development Department
TEL: +81-3-3259-7310
