Cleaning Gases for Semiconductors and Liquid Crystal Manufacturing Equipment

Since completing a multi-purpose manufacturing facility for high-purity fluorine gases in 1988, we have consolidated our position as a major supplier of nitrogen trifluoride, chlorine trifluoride and other cleaning gases for semiconductors and liquid crystal manufacturing equipment.

*Contact Central Glass directly for more information.

NF3

These are used as plasma CVD chamber cleaning gas.

Purity 99.9% or more
Packaging Cylinder (10L, 47L, 440L), Bundle, ISO container Material: Manganese steel

Applications

  • CVD chamber cleaning gas

ClF3

These are used as LP-CVD chamber cleaning gas.
These are used principally for 8-inch CVD apparatus.

Purity 99.9% or more
Packaging Cylinder (3.4L, 10L, 40L, 88L) Material: Stainless steel

Applications

  • LP-CVD chamber cleaning gas

20% diluted fluorine(20%F2/N2)

These are used as LP-CVD chamber cleaning gas.
These are used principally for 12-inch CVD apparatus.

Purity F2:99.9% or more
N2:99.999% or more
Packaging Cylinder (47L), Bundle Material: Manganese steel

Applications

  • LP-CVD chamber cleaning gas

Anhydrous hydrofluoric acid (HF)

These are used as LP-CVD chamber cleaning gas and etching gas.

Purity 99.999% or more
Packaging Cylinder (3.4L, 10L, 40L) Material: Stainless steel

Applications

  • Etching gas, LP-CVD chamber and exhaust pipe cleaning gas

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