Products

CVD Process Gases for Semiconductors

We are commercializing tungsten hexafluoride (WF₆) which is used to mold metal wiring and trimethylsilane (3MS) which is used to form low-k dielectric constant interlayer insulating coating.

WF₆

These are semiconductor specialty gases used in the formation of contact plugs and silicide.

Purity 99.9995% or more

Applications

  • CVD WSix, W Materials

Trimethylsilane (3MS)

These are silicon gases for low dielectric constant interlayer insulating films that respond to advances in semiconductor device miniaturization and increasing integration.

Purity 99.9995% or more

Applications

  • Silicon precursor for Low-k dielectric material

Electronic Materials Related Products

Electronic Materials Related Research and Development

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Electronic Materials Sales Department
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※Except Saturdays, Sundays, public holidays, August 15, and seasonal holiday periods.