CVD Process Gases for Semiconductors

We have developed commercial tungsten hexafluoride which is used to mold metal wiring. We have also developed a commercial silicon gases for low-dielectric insulating layers that can accommodate the ongoing miniaturization and integration in semiconductors.

*Contact Central Glass directly for more information.

WF6

These are semiconductor specialty gases used in the formation of contact plugs and silicide.

Purity 99.9995% or more
Packaging Cylinder (3.4L, 10L, 40L) Material: Stainless steel

Applications

  • CVD WSix, W Materials

SiH(CH3)3 (Trimethylsilane)

These are silicon gases for low dielectric constant interlayer insulating films that respond to advances in semiconductor device miniaturization and increasing integration.

Purity 99.9995% or more
Packaging Cylinder (10L, 47L) Material: Manganese steel

Applications

  • SiC, SiOC, SiO2, SiN membrane materials

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