Message from the President.
Since completing a multi-purpose manufacturing facility for high-purity fluorine gases in 1988, we have consolidated our position as a major supplier of chlorine trifluoride and other cleaning gases for semiconductors manufacturing equipment.
*Contact Central Glass directly for more information.
ClF3
These are used as LP-CVD chamber cleaning gas.
These are used principally for 8-inch CVD apparatus.
| Purity | 99.9% or more |
|---|
Applications
- LP-CVD chamber cleaning gas
20% diluted fluorine(20%F2/N2)
These are used as LP-CVD chamber cleaning gas.
These are used principally for 12-inch CVD apparatus.
| Purity | F2：99.9% or more N2：99.999％ or more |
|---|
Applications
- LP-CVD chamber cleaning gas
Anhydrous hydrofluoric acid (HF)
These are used as LP-CVD chamber cleaning gas and etching gas.
| Purity | 99.999％ or more |
|---|
Applications
- Etching gas, LP-CVD chamber and exhaust pipe cleaning gas
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