Message from the President.
Since completing a multi-purpose manufacturing facility for high-purity fluorine gases in 1988, we have consolidated our position as a major supplier of chlorine trifluoride and other cleaning gases for semiconductors manufacturing equipment.
*Contact Central Glass directly for more information.
ClF3
These are used as LP-CVD chamber cleaning gas.
These are used principally for 8-inch CVD apparatus.
Purity | 99.9% or more |
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Applications
- LP-CVD chamber cleaning gas
20% diluted fluorine(20%F2/N2)
These are used as LP-CVD chamber cleaning gas.
These are used principally for 12-inch CVD apparatus.
Purity | F2:99.9% or more N2:99.999% or more |
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Applications
- LP-CVD chamber cleaning gas
Anhydrous hydrofluoric acid (HF)
These are used as LP-CVD chamber cleaning gas and etching gas.
Purity | 99.999% or more |
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Applications
- Etching gas, LP-CVD chamber and exhaust pipe cleaning gas