As announced on February 21, 2025, Central Glass presented our results and future plans for the development of PFAS-free ArF immersion resist in collaboration with imec at SPIE Advanced Lithography + Patterning 2025, one of the world’s largest international symposia in the field of photolithography. We hereby announce that the content of our presentation was featured in SPIE News*.

Central Glass has focused on developing environmentally friendly materials. We pioneered the global announcement that we successfully developed PFAS-free formulations for both photoacid generators and water-repellent polymers used in ArF immersion resists. Leveraging these advancements, we aim to develop and commercialize PFAS-free ArF immersion resists and will continue to contribute to the innovation in the semiconductor industry and the realization of a sustainable society.

*SPIE News : SPIE's news platform that disseminates information on the latest research results and technological innovations to engineers around the world.

Relevant page in SPIE News : Getting PFAS out of lithography materials

Contact Information

Central Glass Co., Ltd. 
Electronic Materials Sales Department 
Phone: +81-3-3259-7226